Hafnium dioxide (HfO2), a ceramic material with wide bandgap and high dielectric constant, has recently attracted extreme attention in industry, especially in the field of microelectronics, due to the fact that it is the most likely replacement for silicon dioxide (SiO2), the gate insulating layer of the metal-oxide-semiconductor field-effect tubes (MOSFETs), which are the core devices of the current silicon-based integrated circuits, in order to solve the size limitation problem of the current conventional SiO2/ Si structures developed in MOSFETs to address the dimensional limitations of the current development of Si structures. As the size of metal-oxide-semiconductor (MOS) devices shrinks, the gate leakage increases dramatically, causing the devices to fail to operate properly. In order to reduce the gate leakage of ultra-thin gate dielectric MOS devices, high dielectric constant (high k) gate dielectrics need to be used instead of SiO2. Hafnium (Hf) oxides and oxides of nitrogen have become the current research hotspots for high-k gate dielectrics due to their high k values and good thermal stability. When the CMOS device is less than 0.1μm, due to the gate leakage current brought about by the power consumption and high temperature problem needs to be solved, high dielectric film technology has become the key to solve this problem. HfO2 sputtered film due to high dielectric constant, high dielectric strength, low dielectric loss, low leakage current and good capacitance-voltage characteristics, good stability, and can be firmly bonded with the substrate silicon, etc., is considered to be the most promising new insulating film. It is considered to be one of the most promising new insulating dielectric films.

In addition, hafnium oxide has a high optical transmittance from the ultraviolet to infrared region (0.22-12μm), so it also has a broad application prospect in the field of optical film.

Hunan Huajing Powdery Materials Co., Ltd. produces electronic grade HfCl4 products to meet the quality needs of the microelectronics field, serving a large number of domestic and foreign customers in the semiconductor field. At present, Hunan Huajing Powder Material Co., Ltd. has become a world-renowned high-end supplier of HfCl4 products, and has established a long-term stable and friendly cooperative relationship with domestic and foreign mainstream customers. In addition, our company can carry out a variety of metal chloride products customized services, welcome major enterprises to inquire.